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Effect of thickness on properties of MgB2 films
Zhuang Chenggang 1,Ding Lili 1,Chen Liping 2,Zhang Kaicheng 1,Chen Jingping 1,Jia Zhang 1,Feng Qingrong 1,Gan Zizhao 1
1.School of Physics, Peking University
2.School of Physics-Peking University
*Correspondence author
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Funding: 国家自然科学基金(No.G1999064600; No.50572001)
Opened online: 4 January 2006
Accepted by: none
Citation: Zhuang Chenggang ,Ding Lili ,Chen Liping .Effect of thickness on properties of MgB2 films[OL]. [ 4 January 2006] http://en.paper.edu.cn/en_releasepaper/content/4864
 
 
Superconducting MgB2 films on sapphire substrate have been fabricated by the method of hybrid physical-chemical vapor deposition (HPCVD). The film thickness ranges from 75 nm to 3 um. Sample with a thickness of 1.3 um has a Tc(onset) = 40.3 K and ΔTc = 0.15 K. The critical current density, Jc(5 K, 0 T) was estimated, according to the Bean model, as 5.6×105 A/cm2. With the thickness exceeding 1 um, the texture of crystallites and superconducting properties became worse. For the thickness of 3 um, it exhibits a transition at 39.2 K and a width of 0.5 K with Jc(5 K,0 T) = 6.3×105 A/cm2. The investigation indicates that optimum deposition thickness ranges from several hundred nanometers to one micron. This demonstrates that the HPCVD is a simple but effective technique for the application in the production of MgB2 wires
Keywords: superconductivity; MgB2 films; hybrid physical-chemical vapor deposition
 
 
 

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