| Control Action of Temperature on ULSI Silicon Substrate CMP Removal Rate and Kinetics Process |
|
|
Yuling Liu 1,Xinhuan Niu 1 *,Tan Baimei 2,Wang Shengli 2
|
|
|
1.Hebei university of technology
|
|
2.Institute of Microelectronics, Hebei University of Technology
|
|
| *Correspondence author |
| #Submitted by |
|
| Subject: |
| Funding:
教育部博士点基金；天津自然科学基金；国家自然科学基金（No.20050080007；043801211；10676008） |
| Opened online: 7 January 2009 |
| Accepted by:
none |
| Citation: Yuling Liu,Xinhuan Niu,Tan Baimei.Control Action of Temperature on ULSI Silicon Substrate CMP Removal Rate and Kinetics Process[OL]. [ 7 January 2009] http://en.paper.edu.cn/en_releasepaper/content/27423 |
