Electron mobility in strained wurtzite AlGaN/GaN heterojunctions with finite-thick barriers and its pressure effect |
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WU Wei 1,BAN Shiliang 2 * #,QU Yuan 2
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1.School of Physical Science and Technology, Inner Mongolia University
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2.School of Physical Science and Technology, Inner Mongolia University,Hohhot,010021
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*Correspondence author |
#Submitted by |
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Subject: |
Funding:
National Natural Science Foundation of China (No.No.60966001), Key Project of Natural Science Foundation of Inner Mongolia Autonomous Region (No.No. 20080404Zd02), Specialized Research Fund for the Doctoral Program of Higher Education of China (No.No. 20070126001) |
Opened online:25 January 2011 |
Accepted by:
none |
Citation: WU Wei,BAN Shiliang,QU Yuan.Electron mobility in strained wurtzite AlGaN/GaN heterojunctions with finite-thick barriers and its pressure effect[OL]. [25 January 2011] http://en.paper.edu.cn/en_releasepaper/content/4407365 |