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The electrical characteristics of GaAs-MgO interfaces of GaAs MIS Schottky diodes
Gao Xian 1 #,Tang Jinglong 1 *,Fang Dan 1,Wang Shuangpeng 2,Zhao Haifeng 2,Wei Zhipeng 1,Fang Xuan 1,Wang Xiaohua 1,Xu Zhikun 3,Ma Xiaohui 4
1.State Key Laboratory on High-Power Semiconductor Lasers,Changchun University of Science and Technology,130022
2.Key Laboratory of Excited State Process, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Science, Changchun 130033
3.Harbin Normal University, 150080,
4.State Key Laboratory on High-Power Semiconductor Lasers,Changchun University of Science and Technology,130022
*Correspondence author
#Submitted by
Subject:
Funding: the Developing Project of Science and Technology of Jilin Province (No.20121816,201201116), National Key Lab of High Power Semiconductor Lasers Foundation (No.No.9140C310101120C031115), National Natural Science Foundation of China (No.61076039, 61204065, 61205193, 61307045), Research Fund for the Doctoral Program of Higher Education of China (No.20112216120005)
Opened online: 4 August 2014
Accepted by: none
Citation: Gao Xian,Tang Jinglong,Fang Dan.The electrical characteristics of GaAs-MgO interfaces of GaAs MIS Schottky diodes[OL]. [ 4 August 2014] http://en.paper.edu.cn/en_releasepaper/content/4604839
 
 
Many researches pay attention to the metal-semiconductor interface barrier height, due to its effect on device. Deliberate growing an interface layer to affect and improve the quality of device, especially metal-insulator-semiconductor (MIS) structures, arouse wide attention. In this paper, Be-doped GaAs was grown on substrate wafer by MBE on purpose before depositing insulator layer, and then MgO film as the dielectric interface layer of Au/GaAs were deposited using Atomic Layer Deposition (ALD) method. The interface electrical characteristics of the metal-insulator-semiconductor (MIS) structures were investigated in detail. The barrier height and ideal factor of GaAs diode parameters were calculated by means of current-woltage(I-V) characteristics. Experimental result shown that along with the increasing of the doping content, the Schottky barrier height increasing, but the ideal factor decrease at first and then increase.
Keywords:Be-doped GaAs; GaAs MIS; I-V; Schottky barrier height; ideal factor
 
 
 

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