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Diamond-like carbon deposition using microwave plasma chemical vapor deposition
Lai Xiuqiong * #,Chen Junfang ,Silie Fu,Wei Li,Maoping Zhang,Lei Shi, Chunlin Yang
South China Normal University
*Correspondence author
#Submitted by
Subject:
Funding: 教育部博士点基金(No.2004057408)
Opened online: 7 November 2006
Accepted by: none
Citation: Lai Xiuqiong ,Chen Junfang ,Silie Fu.Diamond-like carbon deposition using microwave plasma chemical vapor deposition[OL]. [ 7 November 2006] http://en.paper.edu.cn/en_releasepaper/content/9343
 
 
The spatial plasma density distribution in the reaction chamber of the quartz tube microwave plasma apparatus is diagnosed at p = 1.20 kpa, Pw = 440W by a Langmuir probe, obtaining the biggest plasma density 1.05×1012/cm3. Also, the plasma density under different discharge gas pressure and power is diagnosed. Diamond-like carbon films are achieved at p = 6.8kPa, Pw = 680W with CH4 flow rate being 6ml/min and H2 flow rate being 200ml/min and detected by AFM, Raman spectroscopy instrument and profiler.
Keywords:microwave plasma; Langmuir probe; Diamond-like carbon thin films
 
 
 

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