Fabrication and characterization of Ag-implantation modificated TiO2 films followed with thermal annealing

Xiao Xiangheng; Xu Jinxia; Ren Feng; Cai Guangxu

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Fabrication and characterization of Ag-implantation modificated TiO2 films followed with thermal annealing

Xiao Xiangheng 1 * #,Xu Jinxia 2,Ren Feng 2,Cai Guangxu 2

1.School of Physics and Technology, Wuhan University, Wuhan 430072

2.School of Physics and Technology, Wuhan University, Wuhan 430072, P. R. China

*Correspondence author

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Funding: Specialized Research Fund for the Doctoral Program of Higher Education （No.No. 20100141120042）

Opened online:18 January 2013

Accepted by: none

Citation: Xiao Xiangheng,Xu Jinxia,Ren Feng.Fabrication and characterization of Ag-implantation modificated TiO2 films followed with thermal annealing[OL]. [18 January 2013] http://en.paper.edu.cn/en_releasepaper/content/4514747

TiO2 thin films fabricated by direct-current (DC) reactive magnetron sputtering were implanted with Ag ions at 30 kV to fluences of 1×1016, 3×1016 and 5×1016 ions/cm2, and subsequently annealed at 500 C for 2 h under Ar ambient. Cross-sectional transmission electron microscopy and X-ray photoelectron spectroscopy studies showed that the implanted Ag ions were incorporated in TiO2 to form Ag2O after thermal annealing. The Ag-implanted TiO2 film with fluence of 3×1016 ions/cm2 after an annealing showed improved photocatalytic efficiency comparing to TiO2 film. When the implantation fluence increased to the 5×1016 ions/cm2, the sample showed poorer phtotcatalytic efficiency. These results indicate that there exists an optimum Ag ions implantation fluence. The photocatalytic behavior can be explained by the effect of Ag+ on the physicochemical properties in terms of electronic structures and film texture.

Keywords:Material physics and chemistry; TiO2 film; Ion implantation; Photocatalytic efficiency

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