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| Chromium nitride thin ?lms were deposited on M42 high-speed steel and silicon wafer substrates using closed field unbalanced magnetron sputtering ion plating system (CFUBMSIP). The effect of nitrogen flow on the microstructrue, surface morphology and wettability (contact angle against water) of the various chromium nitride ?lms had been investigated by XRD, AFM,SEM and Contact Angle Analyser. Three solid phases, Cr, Cr2N, and CrN were observed with increasing of nitrogen flow. The roughest film with the largest thickness was obtained at intermediate nitrogen flow which was Cr2N phase. Furthermore, results of contact angle test against water indicated that, the films with Cr2N phase seemed to offer more potential than other phase in terms of non-wettability against water. |
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| Keywords:Chromium nitride films; microstructure; morphology; contact angle |
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