Synthesis of large-size monolayer hexagonal BN film by low pressure CVD

CAI Duanjun; WU Chenping

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Synthesis of large-size monolayer hexagonal BN film by low pressure CVD

CAI Duanjun * #,WU Chenping

School of Physics and Mechanical & Electrical Engineering, Xiamen University, Xiamen 361005, China

*Correspondence author

#Submitted by

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Funding: The Specialized Research Fund for the Doctoral Program of Higher Education （No.20110121120035）

Opened online:20 November 2015

Accepted by: none

Citation: CAI Duanjun,WU Chenping.Synthesis of large-size monolayer hexagonal BN film by low pressure CVD[OL]. [20 November 2015] http://en.paper.edu.cn/en_releasepaper/content/4661223

We report the large-size synthesis of atomic monolayer hexagonal boron nitride (h-BN) film on flexible Cu foil by low pressure chemical vapor deposition (CVD) method. The borazane powder was used as the precursor carried by mixed hydrogen/argon gases. By rolling the Cu foil substrate into cylindrical shape, wafer-scale monolayer h-BN film has been achieved in a size over 7 inch. With the aid of PMMA, the h-BN monolayer was perfectly transferred onto 4" Si wafer for characterization and further electrical applications. This technique could be transferred to thin film growth on any flexible substrates.

Keywords:BN; Monolayer; CVD

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