Study on Corrosion mechanism of copper and inhibitive properties of Domperidone on copper corrosion in different concentration of hydrochloric acid

Zheng Sisi; Xiang Bin; Chai Yuqing; Chen Shijin; Xu Zhongcheng

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Study on Corrosion mechanism of copper and inhibitive properties of Domperidone on copper corrosion in different concentration of hydrochloric acid

Zheng Sisi 1 #,Xiang Bin 1 *,Chai Yuqing 1,Chen Shijin 2,Xu Zhongcheng 3

1.College of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044

2.Bomin Electronics Company Limited, Meizhou 514021, Guangdong

3.Chongqing Sanxia Paints Company Limited, Chongqing 402284

*Correspondence author

#Submitted by

Subject:

Funding: none

Opened online: 3 May 2016

Accepted by: none

Citation: Zheng Sisi,Xiang Bin,Chai Yuqing.Study on Corrosion mechanism of copper and inhibitive properties of Domperidone on copper corrosion in different concentration of hydrochloric acid[OL]. [ 3 May 2016] http://en.paper.edu.cn/en_releasepaper/content/4685229

In this paper, the corrosion behavior of copper in HCl solution was investigated by surface analysis, weight loss and electrochemical measurements. Results show that corrosion products changed from 0.001 to 1 M HCl solution. The primary corrosion product is Cu2O in 0.001-0.01 M HCl solution, however, Cu2+ and a small amount of CuCl in 0.1-1 M HCl solution. It indicates that the corrosion mechanism of copper in different concentration of HCl is different. Domperidone was tested as a corrosion inhibitor for copper in different concentration of HCl solution using weight loss test, open circuit potentials (OCP), potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The experimental results revealed that corrosion rate of copper increased with the increment of HCl concentration from 0.001 to 1 M whether domperidone was added or not, and domperidone was a cathodic inhibitor in HCl solution, with a maximum achievable inhibition efficiency of 98.5% in 0.01 M HCl tested by EIS.

Keywords:Physical Chemistry; Copper; Polarization; EIS; SEM

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